18 citations · 35 across the 3 of their papers we have counts for
3 papers
Atom lithography with two-dimensional optical masks
S. J. H. Petra, K. A. H. van Leeuwen, L. Feenstra +2
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the…
Nanolithography with metastable helium atoms in a high-power standing-wave light field
S. J. H. Petra, L. Feenstra, W. Hogervorst +1
We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of t…
Numerical simulations on the motion of atoms travelling through a standing-wave light field
S. J. H. Petra, K. A. H. van Leeuwen, L. Feenstra +2
The motion of metastable helium atoms travelling through a standing light wave is investigated with a semi-classical numerical model. The results of a calculation including the vel…