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S. Szilasi

2 papers hereh-index 12426 citations33 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author2

Across the 2 of 2 papers where every author was matched, so the position is known.

fields
  • physics.app-ph2

identity via Semantic Scholar / OpenAlex

most citedSelective etching of PDMS: etching as a negative tone resist

8 citations · 8 across the 2 of their papers we have counts for

collaborators

2 papers

physics.app-ph2017

Selective etching of PDMS: etching as positive resist

S. Z. Szilasi, C. Cserhati

Although, poly(dimethylsiloxane) (PDMS) is a widely used material in numerous applications, such as micro- or nanofabrication, the method of its selective etching has not been know…

physics.app-ph2017★ 8 cited

Selective etching of PDMS: etching as a negative tone resist

S. Z. Szilasi, L. Juhasz

In this work authors present for the first time how to apply the additive-free, cured PDMS as a negative tone resist material, demonstrate the creation of PDMS microstructures and…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.