2 papers
physics.app-ph2018
The development of low-temperature atomic layer deposition of HfO2 for TEM sample preparation on soft photo-resist substrate
KP Peng, YC Liu, IF Lin +3
In this study, the method of low-temperature atomic layer deposition (ALD), which is applied on the soft photo-resist (PR) substrate forming hafnium dioxide (HfO2) at 40 C to 85 C,…
physics.app-ph2018
Root Cause Analysis and Correction of Single Metal Contact Open-Induced Scan Chain Failure in 90nm node VLSI
Chao-Cheng Ting, Ya-Chi Liu, Hsuan-Hsien Chen +2
In this paper, the localization of open metal contact for 90nm node SOC is reported based on Electron Beam Absorbed Current (EBAC) technique and scan diagnosis for the first time.…