24 citations · 44 across the 3 of their papers we have counts for
3 papers
An efficient approach to global sensitivity analysis and parameter estimation for line gratings
Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider +4
Scatterometry is a fast, indirect and nondestructive optical method for the quality control in the production of lithography masks. Geometry parameters of line gratings are obtaine…
Nanopatterned Sapphire Substrates in Deep-UV LEDs: Is there an Optical Benefit?
Phillip Manley, Sebastian Walde, Sylvia Hagedorn +3
Light emitting diodes (LEDs) in the deep ultra-violet (DUV) offer new perspectives for multiple applications ranging from 3D printing to sterilization. However, insufficient light…
Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS
Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero +3
Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-a…