3 papers
physics.plasm-ph2025
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
Jonas Giesekus, Anton Pletzer, Florian Beckfeld +3
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In t…
physics.plasm-ph2025
Electronegativity effects on plasma dynamics in He/O RF microplasma jets at atmospheric pressure
Lukas Vogelhuber, Ihor Korolov, Mate Vass +6
This work investigates the transitions between ohmic mode and Penning-Gamma mode in a capacitively coupled radio frequency micro atmospheric pressure plasma jets (CCRF APPJ) op…
physics.plasm-ph2025
Nonlinear Power Absorption in CCRF Discharges: Transition from Symmetric to Asymmetric Configurations
Katharina Noesges, Thomas Mussenbrock
This work builds upon previous studies of nonlinear dynamics in low-pressure capacitively coupled radio-frequency discharges, focusing on the electron power absorption mechanism in…