Deep-Learning-Accelerated Dopant Selection for High-k HfO2 Dielectrics: A Disorder-Resolved Study of Y, Si and Al

Zunair Masroor, Bonwook Gu, Wonjoong Kim +3

Hafnium oxide (HfO2) is the cornerstone high-k dielectric in modern silicon technology. Since the constraints of silicon device fabrication rule out replacing the material itself,…