1 citations · 1 across the 1 of their papers we have counts for
2 papers
physics.app-ph2020
Growth-Etch Metal-Organic Chemical Vapor Deposition Approach of WS2 Atomic-Layers
Assael Cohen, Avinash Patsha, Pranab K. Mohapatra +5
Metal organic chemical vapor deposition (MOCVD) is one of the main methodologies used for thin film fabrication in the semiconductor industry today and is considered one of the mos…
cond-mat.mtrl-sci2017★ 1 cited
Dynamic ligand control of crystalline phase and habit in cesium lead halide nanoparticles
Thumu Udayabhaskararao, Miri Kazes, Lothar Houben +2
Active control over the shape, composition and crystalline habit of nanocrystals is a long sought-after goal. Various methods have been shown to enable post-synthesis modification…