activity
20172024
most citedStopping Resistance Drift in Phase Change Memory Cells and Analysis of Charge Transport in Stable Amorphous Ge2Sb2Te5

3 citations · 4 across the 8 of their papers we have counts for

collaborators

8 papers

physics.app-ph2024

Electronic transport in amorphous Ge2Sb2Te5 phase-change memory line cells and its response to photoexcitation

A. Talukder, M. Kashem, M. Hafiz +4

We electrically characterized melt-quenched amorphized Ge2Sb2Te5 (GST) phase-change memory cells of 20 nm thickness, ~66-124 nm width and ~100-600 nm length with and without photoe…

physics.app-ph2024

Resistance Drift in Melt-Quenched Ge2Sb2Te5 Phase Change Memory Line Cells at Cryogenic Temperatures

A B M Hasan Talukder, Md Tashfiq Bin Kashem, Raihan Khan +3

We characterized resistance drift in phase change memory devices in the 80 K to 300 K temperature range by performing measurements on 20 nm thick, ~70-100 nm wide lateral Ge2Sb2Te5…

physics.app-ph2022★ 3 cited

Stopping Resistance Drift in Phase Change Memory Cells and Analysis of Charge Transport in Stable Amorphous Ge2Sb2Te5

Md Tashfiq Bin Kashem, Raihan Sayeed Khan, ABM Hasan Talukder +2

We stabilize resistance of melt-quenched amorphous Ge2Sb2Te5 (a-GST) phase change memory (PCM) line cells by substantially accelerating resistance drift and bringing it to a stop w…

physics.app-ph2021

Temperature Dependent Characteristics and Electrostatic Threshold Voltage Tuning of Accumulated Body MOSFETs

A. B. M. Hasan Talukder, Brittany Smith, Mustafa Akbulut +3

Narrow-channel accumulated body nMOSFET devices with p-type side-gates surrounding the active area have been electrically characterized between 100 and 400 K with varied side-gate…

physics.app-ph2020

Accelerating and Stopping Resistance Drift in Phase Change Memory Cells via High Electric Field Stress

Raihan Sayeed Khan, A. Hasan Talukder, Faruk Dirisaglik +2

We observed resistance drift in 125 K - 300 K temperature range in melt quenched amorphous Ge2Sb2Te5 line-cells with length x width x thickness = ~500 nm x ~100 nm x ~ 50 nm. Drift…

physics.app-ph2020

Resistance Drift in Ge2Sb2Te5 Phase Change Memory Line Cells at Low Temperatures and Its Response to Photoexcitation

Raihan Sayeed Khan, Faruk Dirisaglik, Ali Gokirmak +1

Resistance drift in phase change materials is characterized in amorphous phase change memory line-cells from 300 K to 125 K range and is observed to follow the previously reported…

cond-mat.mtrl-sci2018

Activation Energy of Metastable Amorphous Ge2Sb2Te5 from Room Temperature to Melt

S. Muneer, J. Scoggin, F. Dirisaglik +7

Resistivity of metastable amorphous Ge2Sb2Te5 (GST) measured at device level show an exponential decline with temperature matching with the steady-state thin-film resistivity measu…

cs.CR2017★ 1 cited

Intrinsically Reliable and Lightweight Physical Obfuscated Keys

Raihan Sayeed Khan, Nadim Kanan, Chenglu Jin +8

Physical Obfuscated Keys (POKs) allow tamper-resistant storage of random keys based on physical disorder. The output bits of current POK designs need to be first corrected due to m…