16 citations · 25 across the 3 of their papers we have counts for
3 papers
Changes in the near edge X-ray absorption fine structure of hybrid organic-inorganic resists upon exposure
Roberto Fallica, Benjamin Watts, Benedikt Rösner +4
We report on the near edge X-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on S…
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
Roberto Fallica, Dimitrios Kazazis, Robert Kirchner +4
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist materi…
A comparative study of resists and lithographic tools using the Lumped Parameter Model
Roberto Fallica, Robert Kirchner, Dominique Mailly +1
A comparison of the performance of high resolution lithographic tools is presented here. We use extreme ultraviolet interference lithography, electron beam lithography, and He ion…