Saifei Dai

collaborators

4 papers

physics.app-ph2025

Unveiling Retention Loss Mechanism in FeFETs with Gate-side Interlayer by Decoupling Trapped Charges and Ferroelectric Polarization

Runhao Han, Tao Hu, Jia Yang +10

We propose a direct experimental extraction technique for trapped charges and quantitative energy band diagrams in the FeFETs with metal-insulator-ferroelectric-insulator-semicondu…

cond-mat.mtrl-sci2024

Effect of Top Al $_{2}$ O $_{3}$ Interlayer Thickness on Memory Window and Reliability of FeFETs With TiN/Al $_{2}$ O $_{3}$ /Hf $_{0.5}$ Zr $_{0.5}$ O $_{2}$ /SiO $_{x}$ /Si (MIFIS) Gate Structure

Tao Hu, Xinpei Jia, Runhao Han +17

We investigate the effect of top Al2O3 interlayer thickness on the memory window (MW) of Si channel ferroelectric field-effect transistors (Si-FeFETs) with TiN/Al $_{2}$ O $_{3}$ /Hf$_{0.5…

cond-mat.mtrl-sci2024

Impact of the Top SiO2 Interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure

Tao Hu, Xianzhou Shao, Mingkai Bai +13

We study the impact of top SiO2 interlayer thickness on the memory window (MW) of Si channel ferroelectric field-effect transistor (FeFET) with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS…

physics.app-ph2024

Impact of Top SiO2 interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate Structure