3 papers
cond-mat.mtrl-sci2025
A Computational Study for Screening High-Selectivity Inhibitors in Area-Selective Atomic Layer Deposition on Amorphous Surfaces
Gijin Kim, Purun-hanul Kim, Suk Gyu Hahm +4
Area-selective atomic layer deposition (AS-ALD) is an emerging technology in semiconductor manufacturing. However, accurately understanding inhibitor reactivity on surfaces remains…
cond-mat.mtrl-sci2025
Etching-to-deposition transition in SiO/SiN using CHF ion-based plasma etching: An atomistic study with neural network potentials
Hyungmin An, Sangmin Oh, Dongheon Lee +4
Plasma etching, a critical process in semiconductor fabrication, utilizes hydrofluorocarbons both as etchants and as precursors for carbon film formation, where precise control ove…
cond-mat.mtrl-sci2025
Unveiling defect motifs in amorphous GeSe using machine learning interatomic potentials
Minseok Moon, Seungwoo Hwang, Jaesun Kim +3
Ovonic threshold switching (OTS) selectors play a critical role in non-volatile memory devices because of their nonlinear electrical behavior and polarity-dependent threshold volta…