2 papers
cond-mat.mtrl-sci2025
A Computational Study for Screening High-Selectivity Inhibitors in Area-Selective Atomic Layer Deposition on Amorphous Surfaces
Gijin Kim, Purun-hanul Kim, Suk Gyu Hahm +4
Area-selective atomic layer deposition (AS-ALD) is an emerging technology in semiconductor manufacturing. However, accurately understanding inhibitor reactivity on surfaces remains…
cond-mat.mtrl-sci2025
Application of pretrained universal machine-learning interatomic potential for physicochemical simulation of liquid electrolytes in Li-ion battery
Suyeon Ju, Jinmu You, Gijin Kim +3
Achieving higher operational voltages, faster charging, and broader temperature ranges for Li-ion batteries necessitates advancements in electrolyte engineering. However, the compl…