2 papers
physics.pop-ph2025
Uncertainty quantification and parameter optimization of plasma etching process using heteroscedastic Gaussian process
Yongsu Jung, Minji Kang, Muyoung Kim +3
This study presents a comprehensive framework for uncertainty quantification (UQ) and design optimization of plasma etching in semiconductor manufacturing. The framework is demonst…
cs.CV2025
In-situ and Non-contact Etch Depth Prediction in Plasma Etching via Machine Learning (ANN & BNN) and Digital Image Colorimetry
Minji Kang, Seongho Kim, Eunseo Go +10
Precise monitoring of etch depth and the thickness of insulating materials, such as Silicon dioxide and silicon nitride, is critical to ensuring device performance and yield in sem…