32 citations · 33 across the 2 of their papers we have counts for
2 papers
physics.optics2024★ 1 cited
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…
physics.app-ph2023★ 32 cited
Resistless EUV lithography: photon-induced oxide patterning on silicon
Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis +7
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading litho…