1 citations · 1 across the 1 of their papers we have counts for
1 paper
Sushant Mittal, Aneesh Nainani, M. C. Abraham +2
FinFET technology is prone to suffer from Line Edge Roughness (LER) based VT variation with scaling. To address this, we proposed an Epitaxially Defined (ED) FinFET (EDFinFET) as a…