most citedEtching Processes of Polytetrafluoroethylene Surfaces Exposed to He and He-O2 Atmospheric Post-discharges

53 citations · 237 across the 9 of their papers we have counts for

collaborators

9 papers

physics.app-ph2018★ 8 cited

Synthesis of Membrane-Electrode Assembly for Fuel Cells by Means of (Sub)-Atmospheric Plasma Processes

Delphine Merche, Thierry Dufour, Julie Hubert +5

An easy procedure to build up membrane-electrode assemblies for applications dedicated to miniaturized PEMFC using H2 or CH3OH by a two-steps atmospheric plasma process is reported…

cond-mat.other2016★ 31 cited

PTFE surface etching in the post-discharge of a RF scanning plasma torch: evidence of ejected fluorinated species

Thierry Dufour, Julie Hubert, Pascal Viville +4

The texturization of poly(tetrafluoroethylene) (PTFE) surfaces is achieved at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium…

physics.chem-ph2016★ 27 cited

Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by atmospheric He-O post-discharge

Thierry Dufour, Julie Hubert, Nicolas Vandencasteele +3

Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been t…

physics.plasm-ph2016

Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O radiofrequency plasma used for polymer surface treatment

Corinne Y. Duluard, Thierry Dufour, Julie Hubert +1

In the context of polymer surface treatment, the afterglow of an atmospheric pressure Ar/O radiofrequency plasma is characterized by optical emission spectroscopy, laser induce…

physics.plasm-ph2016★ 12 cited

Chemical mechanisms inducing a dc current measured in the flowing post-discharge of an RF He-O2 plasma torch

Thierry Dufour, J Hubert, N Vandencasteele +1

The post-discharge of an RF plasma torch supplied with helium and oxygen gases is characterized by mass spectrometry, optical emission spectroscopy and electrical measurements. We…

physics.plasm-ph2016★ 53 cited

Etching Processes of Polytetrafluoroethylene Surfaces Exposed to He and He-O2 Atmospheric Post-discharges

J Hubert, Thierry Dufour, Nicolas Vandencasteele +3

A comparative study of polytetrafluoroethylene (PTFE) surfaces treated by the post-discharge of He and He-O2 plasmas at atmospheric pressure is presented. The characterization of t…