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cs.OH2018
OpenMPL: An Open Source Layout Decomposer
Wei Li, Yuzhe Ma, Qi Sun +4
Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decompositi…
cs.OH2015
E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System
Bei Yu, Kun Yuan, Jhih-Rong Gao +1
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character p…