43 citations · 88 across the 8 of their papers we have counts for
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cs.OH2015
E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System
Bei Yu, Kun Yuan, Jhih-Rong Gao +1
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character p…
cs.OH2014
Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)
Bei Yu, Subhendu Roy, Jhih-Rong Gao +1
Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict…