F. Tian

activity

20152022

most citedImpact of Interlayer and Ferroelectric Materials on Charge Trapping during Endurance Fatigue of FeFET with TiN/HfxZr1-xO2/interlayer/Si (MFIS) Gate Structure

61 citations · 144 across the 4 of their papers we have counts for

collaborators

Showing cond-mat.mtrl-sciShow all

2 papers · 1 filter

cond-mat.mtrl-sci2022★ 24 cited

First-principles study of oxygen vacancy defects in orthorhombic Hf $_{0.5}$ Zr $_{0.5}$ O $_{2}$ /SiO $_{2}$ /Si gate stack

Junshuai Chai, Hao Xu, Jinjuan Xiang +9

The gate defect of the ferroelectric HfO $_{2}$ -based Si field-effect transistor (Si FeFET) plays a dominant role in its reliability issue. The first-principles calculations are an ef…

cond-mat.mtrl-sci2015

Influence of oxygen on thermal stability of nanocrystalline aluminum studied by positron annihilation spectroscopy

Xian-Bao Song, Zhu Wang, Peng-Fei Tai +2

The thermal stability of nanocrystalline (nc) Al has been studied by means of positron lifetime spectroscopy and X-ray diffraction (XRD), prepared by compacting nanoparticles under…

First-principles study of oxygen vacancy defects in orthorhombic Hf0.5​Zr0.5​O2​/SiO2​/Si gate stack

Influence of oxygen on thermal stability of nanocrystalline aluminum studied by positron annihilation spectroscopy

First-principles study of oxygen vacancy defects in orthorhombic Hf $_{0.5}$ Zr $_{0.5}$ O $_{2}$ /SiO $_{2}$ /Si gate stack