135 citations · 501 across the 24 of their papers we have counts for
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Two Orders of Magnitude Enhancement in Oxide Ion Conductivity in Cu2P2O7 via Vanadium Substitution: A Pathway Toward SOFC Electrolytes
Bibhas Ghanta, Kuldeep Singh Chikara, Uttam Kumar Goutam +2
In the quest of green energy, Solid Oxide Fuel Cells (SOFC) have drawn considerable attention for chemical-to-electric energy conversion. In the present paper, we report an enhance…
Tailoring Magnetic Properties of Zigzag Structured Thin Films via Interface Engineering and Columnar Nano-structuring
Sharanjeet Singh, Manisha Priyadarsini, Anup Kumar Bera +5
We report the emergence of a novel interface-induced shape anisotropy component in zigzag-structured thin films fabricated via Sequential Oblique Angle Deposition (S-OAD). In this…
Accessing quasi-flat -bands to harvest large Berry curvature in NdGaSi
Anyesh Saraswati, Jyotirmoy Sau, Vera Misheneva +10
In typical rare-earth lanthanide compounds, the localized 4\textit{f}-electrons have a weak effect on the electrical conduction, limiting their influence on the Berry curvature and…
Engineering magnetic anisotropy and the surface of epitaxial Fe films using ion beam erosion; unveiling self-assembly and tunability
Anup Kumar Bera, Md. Shahid Jamal, Avinash Ganesh Khanderao +1
The engineering of surface morphology and structure of the thin film is one of the essential technological assets for regulating the physical properties and functionalities of thin…
In-situ Growth of Ultrathin Magnetic Films and Tuning the Magnetic Properties by Ion-sculpting
Anup Kumar Bera, Dileep Kumar
Magnetic anisotropy is a key parameter of magnetic materials as it decides the response in the presence of an external magnetic field. The artificial tailoring of magnetic anisotro…
Significantly increased magnetic anisotropy in Co nano-columnar multilayer structure via a unique sequential oblique-normal deposition approach
Arun Singh Dev, Sharanjeet Singh, Anup Kumar Bera +6
Oblique/normal sequential deposition technique is used to create Co based unique multilayer structure [Co-oblique(4.4nm)/Co-normal (4.2 nm)]x10, where each Co-oblique layer is depo…