97 citations · 268 across the 17 of their papers we have counts for
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Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
Fluorescence intensity correlations enable 3D imaging without sample rotations
Robert G. Radloff, Felix F. Zimmermann, Siqi Li +23
Lensless X-ray imaging provides element-specific nanoscale insights into thick samples beyond the reach of conventional light and electron microscopy. Coherent diffraction imaging…
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…