18 citations · 18 across the 2 of their papers we have counts for
2 papers
physics.plasm-ph2021
EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner
Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
physics.plasm-ph2015★ 18 cited
Exploring the electron density in plasmas induced by extreme ultraviolet radiation in argon
R. M. van der Horst, J. Beckers, E. A. Osorio +1
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impac…