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physics.app-ph2025
Effect of Silicon Atom Doping in SiNx Resistive Switching Films
A Mavropoulis, N Vasileiadis, C Bonafos +4
Doping stoichiometric SiNx layers (x=[N]/[Si]=1.33) with Si atoms by ultra-low energy ion implantation (ULE-II) and annealing them at different temperatures can significantly impac…
physics.app-ph2025
Effect of Al2O3 on the operation of SiNX-based MIS RRAMs
A. E. Mavropoulis, N. Vasileiadis, P. Normand +4
The role of a 3 nm Al2O3 layer on top of stoichiometric LPCVD SiNx MIS RRAM cells is investigated by using various electrical characterization techniques. The conductive filament f…