47 citations · 123 across the 7 of their papers we have counts for
7 papers
Tunneling Spectroscopy of Atomically-Thin Al2O3 Films for Tunnel Junctions
Jamie Wilt, Youpin Gong, Ming Gong +8
Metal-Insulator-Metal tunnel junctions (MIMTJ) are common throughout the microelectronics industry. The industry standard AlOx tunnel barrier, formed through oxygen diffusion into…
Detangling Extrinsic and Intrinsic Hysteresis for Detecting Dynamic Switch of Electric Dipoles using Graphene Field-Effect Transistors on Ferroelectric Gates
Chunrui Ma, Youpin Gong, Rongtao Lu +4
A transition in source-drain current vs back gate voltage ID - VBG characteristics from extrinsic polar molecule dominant hysteresis to anti-hysteresis induced by an oxygen deficie…
Controlling the thickness of Josephson tunnel barriers with atomic layer deposition
Alan J. Elliot, Chunrui Ma, Rongtao Lu +5
Atomic Layer Deposition (ALD) is a promising technique for producing Josephson junctions (JJs) with lower defect densities for qubit applications. A key problem with using ALD for…
Integrating Atomic Layer Deposition and Ultra-High Vacuum Physical Vapor Deposition for In Situ Fabrication of Tunnel Junctions
Alan J. Elliot, Gary A. Malek, Rongtao Lu +4
Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel juncti…
Development of Textured Magnesium Oxide Templates on Amorphous Polymer Surfaces Using Ion-Beam-Assisted-Deposition
Alan J. Elliot, Ronald N. Vallejo, Rongtao Lu +1
Biaxially textured MgO templates have been successfully fabricated on several amorphous polymer films including Kapton tapes, polyimide, Poly(methyl methacrylate) (PMMA), and photo…
Fabrication of Nb/Al2O3/Nb Josephson Junctions using in situ Magnetron Sputtering and Atomic Layer Deposition
Rongtao Lu, Alan J. Elliot, Logan Wille +10
Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron s…
Probing the Nucleation of Al2O3 in Atomic Layer Deposition on Aluminum for Ultrathin Tunneling Barriers in Josephson Junctions
Alan J. Elliot, Gary Malek, Logan Wille +5
Ultrathin dielectric tunneling barriers are critical to Josephson junction (JJ) based superconducting quantum bits (qubits). However, the prevailing technique of thermally oxidizin…