activity
20152020
most citedStability of Thin Film Refractory Plasmonic Materials Taken to High Temperatures in Air

1 citations · 1 across the 3 of their papers we have counts for

collaborators

6 papers

physics.app-ph2020

Transition metal nitride thin films deposited at CMOS compatible temperatures for tunable optoelectronic and plasmonic devices

Ryan Bower, Daniel A. L. Loch, Andrey Berenov +4

Transition metal nitrides have received significant interest for use within plasmonic and optoelectronic devices. However, deposition temperature remains a significant barrier to t…

cond-mat.str-el2019

The anomalous Hall effect in non-collinear antiferromagnetic MnNiN thin films

David Boldrin, Ilias Samathrakis, Jan Zemen +7

We have studied the anomalous Hall effect (AHE) in strained thin films of the frustrated antiferromagnet MnNiN. The AHE does not follow the conventional relationships with ma…

cond-mat.mes-hall2018

Optimizing hot electron harvesting at planar metal-semiconductor interfaces with titanium oxynitride thin films

Brock Doiron, Yi Li, Andrei Mihai +8

Understanding metal-semiconductor interfaces is critical to the advancement of photocatalysis and sub-bandgap solar energy harvesting where sub-bandgap photons can be excited and e…

cond-mat.mtrl-sci2018

Multiphase strontium molybdate thin films for plasmonic local heating applications

Matthew P. Wells, Bin Zou, Andrei P. Mihai +6

In the search for alternative plasmonic materials SrMoO3 has recently been identified as possessing a number of desirable optical properties. Owing to the requirement for many plas…

cond-mat.mtrl-sci20171 cited

Stability of Thin Film Refractory Plasmonic Materials Taken to High Temperatures in Air

Matthew P. Wells, Gomathi Gobalakrichenane, Ryan Bower +9

Materials such as W, TiN, and SrRuO3 (SRO) have been suggested as promising alternatives to Au and Ag in plasmonic applications owing to their refractory properties. However, inves…

cond-mat.mtrl-sci2015

Metallic multilayers for X-band Bragg reflector applications

A. P. Mihai, M. Adabi, W. Liu +3

We present a structural and high frequency (8.72GHz) electrical characterization of sputter deposited Ti/W, Ti/Ru and Mo/Ti metallic multilayers for potential application as acoust…