783 citations · 3.4k across the 97 of their papers we have counts for
6 papers · 2 filters
Finite Element Simulation of the Optical Modes of Semiconductor Lasers
J. Pomplun, S. Burger, F. Schmidt +5
In the present article we investigate optical near fields in semiconductor lasers. We perform finite element simulations for two different laser types, namely a super large optical…
Reduced basis method for source mask optimization
J. Pomplun, L. Zschiedrich, S. Burger +4
Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has beco…
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
J. Pomplun, S. Burger, F. Schmidt +3
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) n…
Reduced basis method for computational lithography
J. Pomplun, L. Zschiedrich, S. Burger +1
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usuall…
Finite element method for accurate 3D simulation of plasmonic waveguides
S. Burger, L. Zschiedrich, J. Pomplun +1
Optical properties of hybrid plasmonic waveguides and of low-Q cavities, formed by waveguides of finite length are investigated numerically. These structures are of interest as bui…
Numerical Investigation of Photonic Crystal Microcavities in Silicon-on-Insulator Waveguides
S. Burger, F. Schmidt, L. Zschiedrich
Optical resonances in 1D photonic crystal microcavities are investigated numerically using finite-element light scattering and eigenmode solvers. The results are validated by compa…