2 papers
physics.plasm-ph2026
Control of Electron Energy Distribution Functions by Current Waveform Tailoring in Inductively Coupled Radio Frequency Plasmas
Zhaoyu Chen, Zili Chen, Yu Wang +6
Based on two-dimensional particle-in-cell simulations a novel approach towards Electron Energy Probability Function (EEPF) and plasma chemistry control by Current Waveform Tailorin…
physics.plasm-ph2025
Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
Jonas Giesekus, Anton Pletzer, Florian Beckfeld +3
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In t…