Implantation studies of low-energy positive muons in niobium thin films

Ryan M. L. McFadden, Andreas Suter, Leon Ruf +5

Here we study the range of keV positive muons $\hat{I}{¼}^{+}$ implanted in Nb${}_2$O${}_5$($x$ nm)/Nb($y$ nm)/SiO${}_2$(300 nm)/Si [$x$ = 3.6 nm, 3.3 nm; $y$ = 42.0 nm, 60.1 nm] thin films using…