Atomic-Scale Mechanisms of SiO${}_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential

Jaehoon Kim, Minseok Moon, Hyunsung Cho +5

Plasma-enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO${}_2$) is widely used for low-temperature fabrication of dielectric thin films, yet its atomic-scale growth…