Atomistic Insights into MOCVD Growth of GaAs using a Closed Loop Autonomous System Combining Directed Reinforcement Learning and Kinetic Monte Carlo Simulations

Hrishi V. Harsora, Ashutosh Krishna Amaram, Raghavan Ranganathan +1

Conventional process optimization of the Metal-Organic Chemical Vapor Deposition (MOCVD) growth parameters to achieve high-quality thin films relies on iterative, resource-intensiv…