2 papers
cs.LG2026
Feature identification for parameter extraction and defect detection using machine learning
Yan Guo, Helda Pahlavani, Artem Khachaturiants +5
Process control of advanced semiconductor nodes is not only pushing the limits of metrology equipment requirements in terms of resolution and throughput but also in terms of the ri…
cs.LG2026
Image resolution enhancement for advanced semiconductor nodes
Lucas Rencker, Omid Tajalizadehkhoob, Khalid Elsayed +7
Advanced semiconductor nodes are pushing the limits of feature sizes and require metrology with sub-nm resolution without compromising on the throughput as needed for in-line proce…