collaborators

1 paper

cond-mat.mtrl-sci2026

First Plasma Atomic Layer Etching of Diamond via O/Kr Chemistry

Duc Duy Tran, Cedric Mannequin, Aboulaye Traore +2

We report the first plasma atomic layer etching (ALE) process for diamond using a cyclic plasma sequence composed of two separated steps: oxygen surface modification and krypton io…