2 papers
cond-mat.soft2010
Organization of Block Copolymers using NanoImprint Lithography: Comparison of Theory and Experiments
Xingkun Man, Daivd Andelman, Henri Orland +5
We present NanoImprint lithography experiments and modeling of thin films of block copolymers (BCP). The NanoImprint lithography is used to align perpendicularly lamellar phases, o…
cond-mat.soft2009
Easy orientation of diblock copolymers on self-assembled monolayers using UV irradiation
Pang-Hung Liu, Patrick Guenoun, Jean Daillant
A simple method based on UV/ozone treatment is proposed to control the surface energy of dense grafted silane layers for orientating block copolymer mesophases. Our method allows o…