Diminished Short Channel Effects in Nanoscale Double-Gate Silicon-On-Insulator Metal-Oxide- Semiconductor Field-Effect-Transistors due to Induced Back-Gate Step Potential

M. Jagadesh Kumar, G. V. Reddy

In this letter we discuss how the short channel behavior in sub 100 nm channel range can be improved by inducing a step surface potential profile at the back gate of an asymmetrica…