16 citations · 21 across the 2 of their papers we have counts for
2 papers
physics.plasm-ph2013★ 5 cited
Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride
Felix Mitschker, Marina Prenzel, Jan Benedikt +2
The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter c…
physics.plasm-ph2013★ 16 cited
Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering
Marina Prenzel, Annika Kortmann, Adrian Stein +3
Al2O3 thin films have been deposited at substrate temperatures between 500°C to 600°C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the en…