most citedUltra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS)

9 citations · 9 across the 1 of their papers we have counts for

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1 paper

cond-mat.mtrl-sci2013★ 9 cited

Ultra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS)

Daniel Primetzhofer, Eugenio Dentoni Litta, Anders Hallén +2

We explore the potential of Time-Of-Flight Medium Energy Ion Scattering (TOFMEIS) for thin film analysis and analyze possible difficulties in evaluation of experimental spectra. Is…