collaborators

1 paper

cond-mat.mtrl-sci2013

Fabrication of Nb/Al2O3/Nb Josephson Junctions using in situ Magnetron Sputtering and Atomic Layer Deposition

Rongtao Lu, Alan J. Elliot, Logan Wille +10

Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron s…