most citedComparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

47 citations · 47 across the 1 of their papers we have counts for

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1 paper

physics.plasm-ph2013★ 47 cited

Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas

A Dolgov, D Lopaev, T Rachimova +6

Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal…