collaborators

1 paper

cond-mat.mtrl-sci2014

Using top graphene layer as sacrificial protection during dielectric atomic layer deposition

Xiaohui Tang, Nicolas Reckinger, Olivier Poncelet +5

We investigate the structural damage of graphene underlying dielectrics (HfO2 and Al2O3) by remote plasma-enhanced atomic layer deposition (PE-ALD). Dielectric film is grown on bil…