most citedCharacteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2

9 citations · 9 across the 1 of their papers we have counts for

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cond-mat.mtrl-sci2014★ 9 cited

Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2

Jinho Kim, Woochool Jang, Jingyu Park +4

In this study, the characteristics of nickel thin film deposited by remote plasma atomic layer deposition (RPALD) on p-type Si substrate and formation of nickel silicide using rapi…