most citedDischarge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

25 citations · 25 across the 1 of their papers we have counts for

collaborators

1 paper

physics.plasm-ph2014★ 25 cited

Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

A Dolgov, O Yakushev, A Abrikosov +4

An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma…