most citedDirect comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling

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cond-mat.mes-hall2015★ 24 cited

Direct comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling

M. A. Basith, S. McVitie, D. McGrouther +2

Nominally identical permalloy nanowires, with widths down to 150 nm, were fabricated onto a single electron transparent SiN membrane using electron beam lithography (EB…