Impact of post deposition annealing in O2 ambient on structural properties of nanocrystalline hafnium oxide thin film

Shilpi Pandey, Prateek Kothari, Sunil Kumar Sharma +2

In the present work, HfO2 thin film (100nm) has been deposited by sputtering technique and annealed at various temperatures ranging from 400 to 1000\degree (in step of 200 \degree)…