Substrate effects and diffusion dominated roughening in Cu2O electrodeposition

I. S. Brandt, V. C. Zoldan, V. Stenger +4

Cuprous oxide (Cu2O) films from 25 nm to 1500 nm were electrodeposited on n-Si(100) and Ni/n-Si(100) substrates from aqueous solution at room temperature. X-ray diffraction and tra…