11 citations · 11 across the 1 of their papers we have counts for
1 paper
S. Boisseau, A. -B. Duret, J. -J. Chaillout +1
This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electr…