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researcher

X. W. Wang

2 papers here

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author2

Across the 2 of 2 papers where every author was matched, so the position is known.

fields
  • cond-mat.mes-hall2

identity via Semantic Scholar / OpenAlex

most cited20-80nm Channel Length InGaAs Gate-all-around Nanowire MOSFETs with EOT=1.2nm and Lowest SS=63mV/dec

32 citations · 42 across the 2 of their papers we have counts for

collaborators

2 papers

cond-mat.mes-hall2012★ 32 cited

20-80nm Channel Length InGaAs Gate-all-around Nanowire MOSFETs with EOT=1.2nm and Lowest SS=63mV/dec

J. J. Gu, X. W. Wang, H. Wu +5

In this paper, 20nm - 80nm channel length (Lch) InGaAs gate- all-around (GAA) nanowire MOSFETs with record high on- state and off-state performance have been demonstrated by equiva…

cond-mat.mes-hall2012★ 10 cited

III-V Gate-all-around Nanowire MOSFET Process Technology: From 3D to 4D

J. J. Gu, X. W. Wang, J. Shao +4

In this paper, we have experimentally demonstrated, for the first time, III-V 4D transistors with vertically stacked InGaAs nanowire (NW) channels and gate-all-around (GAA) archite…

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