activity
20102017
most citedCoherent population transfer between weakly-coupled states in a ladder-type superconducting qutrit

82 citations · 281 across the 8 of their papers we have counts for

collaborators

8 papers

cond-mat.mtrl-sci2017★ 47 cited

Tunneling Spectroscopy of Atomically-Thin Al2O3 Films for Tunnel Junctions

Jamie Wilt, Youpin Gong, Ming Gong +8

Metal-Insulator-Metal tunnel junctions (MIMTJ) are common throughout the microelectronics industry. The industry standard AlOx tunnel barrier, formed through oxygen diffusion into…

quant-ph2015★ 82 cited

Coherent population transfer between weakly-coupled states in a ladder-type superconducting qutrit

H. K. Xu, W. Y. Liu, G. M. Xue +9

Stimulated Raman adiabatic passage (STIRAP) offers significant advantages for coherent population transfer between un- or weakly-coupled states and has the potential of realizing e…

cond-mat.supr-con2014★ 1 cited

Controlling the thickness of Josephson tunnel barriers with atomic layer deposition

Alan J. Elliot, Chunrui Ma, Rongtao Lu +5

Atomic Layer Deposition (ALD) is a promising technique for producing Josephson junctions (JJs) with lower defect densities for qubit applications. A key problem with using ALD for…

cond-mat.mtrl-sci2014★ 22 cited

Integrating Atomic Layer Deposition and Ultra-High Vacuum Physical Vapor Deposition for In Situ Fabrication of Tunnel Junctions

Alan J. Elliot, Gary A. Malek, Rongtao Lu +4

Atomic Layer Deposition (ALD) is a promising technique for growing ultrathin, pristine dielectrics on metal substrates, which is essential to many electronic devices. Tunnel juncti…

cond-mat.mtrl-sci2013★ 24 cited

Fabrication of Nb/Al2O3/Nb Josephson Junctions using in situ Magnetron Sputtering and Atomic Layer Deposition

Rongtao Lu, Alan J. Elliot, Logan Wille +10

Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron s…

cond-mat.mtrl-sci2013★ 26 cited

Probing the Nucleation of Al2O3 in Atomic Layer Deposition on Aluminum for Ultrathin Tunneling Barriers in Josephson Junctions

Alan J. Elliot, Gary Malek, Logan Wille +5

Ultrathin dielectric tunneling barriers are critical to Josephson junction (JJ) based superconducting quantum bits (qubits). However, the prevailing technique of thermally oxidizin…

cond-mat.supr-con2011★ 50 cited

Quantum Phase Diffusion in a Small Underdamped Josephson Junction

H. F. Yu, X. B. Zhu, Z. H. Peng +8

Quantum phase diffusion in a small underdamped Nb/AlO/Nb junction ( 0.4 m) is demonstrated in a wide temperature range of 25-140 mK where macroscopic quantum tunne…

cond-mat.supr-con2010★ 29 cited

Quantum and classical resonant escapes of a strongly-driven Josephson junction

H. F. Yu, X. B. Zhu, Z. H. Peng +9

The properties of phase escape in a dc SQUID at 25 mK, which is well below quantum-to-classical crossover temperature , in the presence of strong resonant ac driving have b…