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T. Liersch

1 paper hereh-index 187 citations2 works total

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author position
  • middle author1

Across the 1 of 1 paper where every author was matched, so the position is known.

fields
  • physics.app-ph1

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most citedAn upgraded ultra-high vacuum magnetron-sputtering system for high-versatility and software-controlled deposition

5 citations · 5 across the 1 of their papers we have counts for

collaborators

1 paper

physics.app-ph2020★ 5 cited

An upgraded ultra-high vacuum magnetron-sputtering system for high-versatility and software-controlled deposition

Arnaud le Febvrier, Ludvig Landalv, Thomas Liersch +3

Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental res…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.