activity
20082023
most citedDiffuse-interface model for nanopatterning induced by self-sustained ion etch masking

52 citations · 169 across the 8 of their papers we have counts for

collaborators

8 papers

physics.app-ph2023★ 6 cited

True Circular Dichroism in Optically Active Achiral Metasurfaces and Its Relation to Chiral Near-Fields

Mathieu Nicolas, Per Magnus Walmsness, Jayeeta Amboli +6

Optically active achiral metasurfaces offer a promising way to detect chiral molecules based on chiroptic methods. The combination of plasmonic enhanced circular dichroism and reve…

physics.optics2013★ 6 cited

Design, optimization and realization of FLC based Stokes polarimeters and Mueller matrix ellipsometer using a genetic algorithm

Lars Martin S. Aas, Daniel G. Skåre, Pål G. Ellingsen +2

The design of broad-band polarimeters with high performance is challenging due to the wavelength dependence of optical components. An efficient Genetic Algorithm (GA) computer code…

physics.optics2010★ 35 cited

Fast and optimal broad-band Stokes/Mueller polarimeter design by the use of a genetic algorithm

Paul Anton Letnes, Ingar Stian Nerbø, Lars Martin Sandvik Aas +2

A fast multichannel Stokes/Mueller polarimeter with no mechanically moving parts has been designed to have close to optimal performance from 430-2000 nm by applying a genetic algor…

physics.optics2010★ 27 cited

Near infra-red Mueller matrix imaging system and application to strain imaging

Lars Martin Sandvik Aas, Pål Gunnar Ellingsen, Morten Kildemo

We report on the design and performance of a near infra-red Mueller matrix imaging ellipsometer, and apply the instrument to strain imag- ing in near infra-red transparent solids.…

physics.optics2010★ 12 cited

Dynamic Response of a fast near infra-red Mueller matrix ellipsometer

Lars Martin Sandvik Aas, Pål Gunnar Ellingsen, Morten Kildemo +1

The dynamic response of a near infrared Ferroelectric Liquid Crystal based Mueller matrix ellipsometer (NIR FLC-MME) is presented. A time dependent simulation model, using the meas…

cond-mat.mtrl-sci2010★ 52 cited

Diffuse-interface model for nanopatterning induced by self-sustained ion etch masking

S. Le Roy, E. Søndergård, M. Kildemo +2

We construct a simple phenomenological diffuse-interface model for composition-induced nanopatterning during ion sputtering of alloys. In simulations, this model reproduces without…