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I. Chowdhury

4 papers hereh-index 4103 citations7 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author1
  • middle author3

Across the 4 of 4 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci3
  • physics.chem-ph1
same name
  • I. Chowdhury — 8 papers, h 7
  • I. Chowdhury — 4 papers, h 2
  • I. Chowdhury — 1 paper, h 3
  • I. Chowdhury — 1 paper, h 4

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

most citedHigh growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor

49 citations · 96 across the 4 of their papers we have counts for

collaborators
Showing cond-mat.mtrl-sciShow all

3 papers · 1 filter

cond-mat.mtrl-sci2011★ 22 cited

High purity semi-insulating 4H-SiC epitaxial layers by Defect-Competition Epitaxy

MVS Chandrashekhar, Iftekhar Chowdhury, P. Kaminski +3

Thick, high-purity semi-insulating (SI)homoepitaxial layers on Si-face 4H-SiC weregrownsystematically, with resistivity \geq 109Ω-cmby maintaining high C/Si ratios 1.3-15 during gr…

cond-mat.mtrl-sci2010★ 49 cited

High growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor

Iftekhar Chowdhury, MVS Chandrasekhar, Paul B Klein +2

Thick, high quality 4H-SiC epilayers have been grown in a vertical hot-wall chemical vapor deposition system at a high growth rate on (0001) 80 off-axis substrates. We discuss the…

cond-mat.mtrl-sci2010★ 21 cited

Doping Dependence of Thermal Oxidation on n-type 4H-SiC

B. K. Daas, M. M. Islam, I. A. Chowdhury +3

The doping dependence of dry thermal oxidation rates in n-type 4H-SiC was investigated. The oxidation was performed in the temperature range 1000C to 1200C for samples with nitroge…

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